| 1. | It has broad application prospect in the following fields such as microelectronics , photoelectronic devices , large screen flat panel display , field emitter array , acoustic surface wave device , photon crystal , light waveguide array , holographic honeycomb lens and micro - optical element array , micro - structure manufacture , fabrication of large area grating and grid of high resolution , photoresist performance testing , profile measurement and metrology , etc . the paper only involves the primary research of interferometric lithography
在微电子、光电子器件、大屏幕平板显示器、场发射器阵列、表面声波器件、光子晶体、光波导阵列、全息透镜和微光学元件阵列、微结构制造，高分辨、大面积光栅和网格制造，在抗蚀剂性能测试、面形测量和计量等领域，干涉光刻技术都具有广阔的应用前景。 |
